Plating Q&A: Gold Pitting Problem
A Products Finishing reader writes to Art Kushner: How can we solve problems with pitting and haze on our hard gold deposit?
A Products Finishing reader writes to Art Kushner:
Q. How can we solve problems with pitting and haze on our hard gold deposit?—J.R.
A. Pitting can be caused by a number of different factors. Hydrogen gassing, particulate matter suspended in the plating solution and inadequate cleaning of the base material are three common causes.
Hydrogen gas formed during the plating process can stick to the surface of the parts being plated. If the bubbles that stick to the surface do not slide off rapidly, the plate will form pits. Typically, a pit due to hydrogen has a “small” tail. In most plating baths, this problem can be minimized by adding wetting agents/surfactants. The problem also can be minimized by increasing the agitation of the bath. Depending on the type of agitation, different wetting agents may be required.
To see Art's complete answer, please click HERE
Also, to see all of Art Kushner's answers to reader questions, please visit our Plating Zone by clicking HERE
Related Content
-
Novel Wastewater Treatment Targets Micropollutants
Swiss wastewater treatment technology provider Oxyle specializes in advanced wastewater treatment for removal of highly persistent micropollutants such as PFAS.
-
NASF/AESF Foundation Research Project #120: Electrochemical Destruction of Perfluorooctanesulfonate in Electroplating Wastewaters – January – December 2023
This NASF-AESF Foundation research project report covers quarterly reporting for the year 2023 at the University of Illinois at Chicago. The objective of this work is to utilize a cost-effective reactive electrochemical membrane (REM) for the removal of PFAS from synthetic electroplating wastewater. Discussed here are the oxidation of PFOA with three different catalysts, development of a method for detecting PFAS, as well as work on 6:2-fluorotelomersulfonic acid (6:2 FTS) and electrodeposited bismuth/tin oxide catalysts.
-
NASF/AESF Foundation Research Project #120: Electrochemical Destruction of Perfluorooctanesulfonate in Electroplating Wastewaters - April 2022-March 2023
This NASF-AESF Foundation research project report covers project work from April 2022 to March 2023 at the University of Illinois at Chicago. The overall objective of this work is to utilize a cost-effective reactive electrochemical membrane (REM) for the removal of PFAS from synthetic electroplating wastewater. Initial results for the oxidation of PFOA with three different catalysts are discussed.
